Transparent Conducting Gallium-Doped Zinc Oxide Thin Films on Glass Substrate for Optoelectronic Device Applications

Himadri Sekhar Das1,2,3Email

Santanu Mishra2

Mrinal Kanti Dash2

Prasanta Kumar Nandi3

Subir Kumar Maity4

Debnarayan Khatua5

Anindita Chatterjee6

Zhanhu Guo7

Ben Bin Xu7

Gourisankar Roymahapatra4

Department of Electronics and Communication Engineering, Haldia Institute of Technology, Haldia, 721657, India
Department of Applied Sciences, Haldia Institute of Technology, Haldia, 721657, India
Department of Chemistry, Indian Institute of Engineering Science and Technology, Shibpur, 711103, India
School of Electronics Engineering, Kalinga Institute Industrial Technology, Bhubaneswar, 751024, India
School of Sciences, Woxsen University, Hyderabad Telangana, 502345, India 
Dept. of Chemistry, Raghu Engineering College, Visakhapatnam, Andhra Pradesh, 530062, India
Mechanical and Construction Engineering, Faculty of Engineering and Environment, Northumbria University, Newcastle Upon Tyne, NE1 8ST, UK

Abstract

Gallium (Ga)-doped zinc oxide (GZO) thin film is a promising alternative anode material to indium doped tin oxide (ITO) in organic light-emitting diode (OLED) applications. In this paper, ZnO:Ga transparent conducting oxide (TCO) thin films were deposited on glass substrates by radio frequency (RF) magnetron sputtering techniques. Variations of electrical, optical, and structural properties of GZO films with different substrate temperatures were investigated. Among different substrate temperatures, 200 ºC substrate temperature deposited film shows the lowest resistivity 2.45×10-4 Ω cm with an optical transmission of more than 90 %. Finally, GZO thin film was used as an anode material in OLED devices and was also compared with the ITO anode based OLED. The obtained GZO based OLED shows similar performance compared with ITO based OLED devices.