A Review on Thin Film Technology and Nanomaterial Characterization Techniques
Abstract
Over the last 200 years, there is increase in the processes of depositing thin film materials have been considerably developing. In order to improve the desired film thickness and characteristics, good understanding of the various deposition methods and processes is necessary. The purpose of this review paper is to display the critical analysis of existing methods of thin film deposition. Paper discusses some important thin film techniques which are advanced and suitable for analyses of thin films. As nanomaterials are invisible and requires various advanced characterization to investigate their physical and chemical properties. Therefore, it becomes essential to determine these properties: there is need of advanced scientific tools for the analysis of nanomaterials and thin films. A comprehensive list of fundamentals of thin film technology, including deposition, structure, and film properties, advanced characterization tools and applications is presented together.