Electrochemically Deposited ZnO and Sol-Gel Spin-Coated Zn-doped TiO2 Thin Films on FTO: An Optical Investigation
Abstract
In this work describes an electrochemical deposition and sol-gel spin coating processes were employed for the preparation of ZnO nanostructure on zinc doped TiO2 (Zn-TiO2) thin film on the fluorine doped tin-oxide (FTO) substrate and calcinated 500°C for 30 min. The prepared samples tested by using X-ray diffraction (XRD), Raman spectroscopy and atomic force microscopy (AFM) for their structural, functional and topographical properties. First, the XRD pattern evidenced the anatase-TiO2 and ZnO hexagonal Wurtzite structure with the standard JCPDS files. Raman spectrum revealed, the first order scattering peak (444 cm-1) of E2 low and high active phonon modes which was corresponding to the ZnO. The broader peaks noticed between 515 to 720 cm-1 represents the anatase TiO2 crystals. Furthermore, AFM recorded with a scanning resolution of 256 x 256 pixels. This surface topography revealed the average roughness of 280 nm. Finally, a brief discussion of future research information relating to this topic will be presented.